Deposit models the physical vapour deposition process (PVD) of organic small molecule thin-films, such as used in OLED, OFET and OPV applications. Realistic thin-films with atomic resultion are deposited from the ground up. Efficient implementation and parallelization allows the fast generation of morphologies on the 10 nm scale on the time scale of a few days. Interaction between the molecules during the deposition process is modeled on the basis of full quantum-mechanical calculations.

Read the Deposit Product Specifications for further information.